American Elements: Tin Foil Supplier & Tech Info

American Elements’ Nanometal™, nanofoil manufacturing unit produces ultra thin foil as thin as only 50 nm thick in diameters up to 910 mm. Typically, foils are in thicknesses from 20 nm to 1000 nm, 1 micron, 2 micron, and up to a few microns thick. Nanometal™ ultra thin foil can also be produced on a substrate with a parting agent to permit removal by floating and can then be mounted on frames. Frames may be washers, rings, or more-complicated assemblies. Nanometal™ is one of the many ultra high purity metal forms available from American Elements for semiconductor and other electronic applications and for use in coating and thin film Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Organometallic and Chemical Vapor Deposition (MOCVD) in specific applications such as fuel cells and solar energy. We also produce metallic nanopowders (see also Nanotechnology) and metals by crystallization for this purpose. For foils >1 micron thick see our Tin Foil page. We also produce Tin as rods, powder and plates. Other shapes are available by request.

Tin is a Block P, Group 14, Period 5 element. The electronic configuration is [Kr] 4d¹⁰ 5s² 5p². In its elemental form tin's CAS number is 7440-31-5. The tin atom has a radius of 140.5.pm and it's Van der Waals radius is 217.pm.

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