Tungsten Oxide Sputtering Target
WO3
1314-35-8
1314-35-8
| Product | Product Code |
Order or Specifications |
99.9% Tungsten Oxide Sputtering Target |
W-OX-03ST
|
 |
99.99% Tungsten Oxide Sputtering Target |
W-OX-04ST
|
|
99.999% Tungsten Oxide Sputtering Target |
W-OX-05ST
|
|
American Elements specializes in producing high purity Tungsten oxide sputtering targets with the highest possible density 
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Tungsten Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. See research below. Other shapes are available by request.
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Tungsten Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. See research below. Other shapes are available by request. Tungsten is a Block D, Group 6, Period 6 element. The electronic configuration is [Xe] 4f14 5d4 6s2. In its elemental form tungsten's CAS number is 7440-33-7. The tungsten atom has a radius of 137.pm and it's Van der Waals radius is 200.pm.
| Formula | CAS No. | Appearance | Molecular Weight |
| WO3 | 1314-35-8 | Yellow Powder | 231.85 |
| CATALOGUE PRODUIT | Submicroniques et nanopoudres | Tolling | Ultra High Purity | Sputtering Public | Crystal Growth | Rod, Plate, poudre, etc. |
© 2001-2007. American Elements U.S. Rest une marque déposée. Tous droits réservés.
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Ce site Web et toutes les pages, des dessins, des concepts, des logos, des schémas de couleurs et présentes sont
Les droits de propriété des droits d'auteur et la propriété intellectuelle des éléments américains.
